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Allresist presents new product development at the EIPBN Conference (USA)

The focus is on our new choline-based developer, a safer and more environmentally friendly alternative to conventional TMAH developers. While TMAH poses significant health and environmental risks due to its high acute toxicity, choline hydroxide offers a considerably safer and more biodegradable solution. Studies have shown that the new developer still achieves comparable — and in some applications even superior — performance.

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53rd Issue of the AR NEWS

Content: 1. Allresist at the EIPBN (USA), MNE (Switzerland) and SEMICON Europa conferences // 2. The established HSQ resist Medusa 84 SiH // 3. Phoenix 81 also available as a PPA liquid resist for the NanoFrazor // 4. Environmentally friendly alternatives to TMAH- and NEP-based process chemicals // 5. Allresist expands and starts construction of building extension in May

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S3 Alliance visits Allresist

S3 Alliance visited our premises to strengthen our partnership. They distribute Allresist products in the UK and are a market-oriented organization with more than 20 years of experience in the semiconductor/MEMS, renewable energy, biotechnology, and related fields.

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52nd Issue of the AR NEWS

Content: 1. Allresist at the conferences EIPBN 2025 and MNE 2025 // 2. Medusa 84 – AR-N 8400 SiH, the reliable alternative to HSQ resist // 3. The new choline developer AR 300-41 – a safe alternative to TMAH developers

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October 2025: Medusa 84 – the reliable alternative to HSQ resist

Medusa 84 samples were furthermore stored for 3.5 months at -30 °C, at 0 °C, and at room temperature. Surprisingly, there was hardly any difference between the three storage conditions with respect to the quality of the resist. Regardless of the storage temperature, all samples exhibited a minimum line width between 3.6 and 4.2 nm.

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51st Issue of the AR NEWS

Content: 1. Allresist at the conferences EIPBN 2025 and MNE 2025 // 2. Medusa 84 – AR-N 8400 SiH: High-performance alternative to HSQ-based resists // 3. Allresist establishes new facility in Teltow // 4. ZIM-project successfully completed: Development of a photoresist for structuring non-planar objects

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April 2025: New environmentally friendly remover AR 300-77

In line with our responsibility toward users and employees, we have investigated alternatives to replace these removers and identified carbonate-based solvents as promising candidates. Our new remover, AR 300-77, consists of a mixture of propylene carbonate and diethyl carbonate and can be used without risk in compliance with all relevant safety standards.

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January 2025: Electra 94 with extended shelf life – AR-PC 5094.02

Thanks to its excellent stability, we can now extend the shelf life of Electra 94 to two years. Ongoing continuous quality control will provide information on whether extending the shelf life beyond two years is possible.

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Customer letter about our further development of high-tech resists Medusa, Electra and Phoenix

We would like to inform you about the further development of our high-tech resists Medusa 84, Electra 94 and Phoenix 81.

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Important information about deliveries between years 2024 / 2025

In order to align operational procedures with the needs of our customers, we have set a final order acceptance date: Order stop: 12/11/2024 and Delivery stop: 12/13/2024

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