The successful evaluation of our development at one of our largest customers was the reason for us to select AR-N 4400-50 as resist of the month of July.
1. 27 years of Allresist – firmly established on the world market
2. Allresist successful on the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 for e-beam graytone lithography
4. Resist structures for the spin Hall effect
1. Allresist with view to the future
2. Investing in novel technologies
3. Structurable conductive layers
4. CSAR 62 – great demand around the world
1. Prime Minister Dietmar Woidke visits Allresist in times of Covid-19
2. Higher shelf live and more sensitive HSQ-alternative Medusa 82 for grayscale
3. Medusa for UV lithography
4. Thermally structurable resists
Resist CSAR 62 is meanwhile established worldwide, with continuously increasing demands. Since we manufacture the polymer by ourselves, we had to scale up polymer synthesis. First of all, CSAR 62 made the jump from laboratory scale to a 20-liter trailer.
We continued the development work on our new Atlas 46 photoresist also in 2021. Due to own results or recommendations and requests from our users, its formulation and properties were now improved.
In 2004, the first bottom resist (BR) was developed in collaboration with the Center for Intelligent Systems (CiS, Erfurt). This bottom resist is non-light sensitive and can be developed in an aqueous alkaline manner.
The novel corona virus (COVID-19) is spreading rapidly across national borders. So far, the operational processes of Allresist GmbH have hardly been affected. We strive to meet our customers’ requirements as best we can in this tense situation and to minimize the impact on our operational processes as much as possible. The focus is on protecting our colleagues and our customers.
Optically dense resists play an increasingly important role in industry. So-called black resists are required in optical industry, in automotive industry (for headlights) and in the manufacture of rotary encoders.
Medusa 82 UV was already chosen as resist of the month in January 2019. Back then, we highly appreciated the first results for a use as photoresist. Shown are now results with respect to an application in grayscale lithography which were also presented at the MNE 2019 in Greece.