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Developer AR 300-35

For the development of photoresists and novolac-based e-beam resist films

Characterisation

  • buffered, colourless aqueous-alkaline solutions for photoresist development with low dark erosion
  • AR 300-35 universal, wide process range for layers up to 6 μm

Interesting Resist Wiki articles

Properties

  • Hauptbestandteile
    Natriummetasililkat/-phosphat
  • Einsatzgebiet
    Tauch-, Puddleentwicklung
  • Normalität
    0,33 n

Available order sizes

  • 1 x 2.5 L
  • 4 x 2.5 L
  • 1 x 5 L
  • 4 x 5 L
  • 20 x 5 L

Please contact us for further requests.

Suitable products

Photoresist AR-P 3100 series

Adhesion-enhanced positive resists for the production of masks and fine scale divisions

Photoresist AR-P 3500 (T) series

Sensitive positive-tone standard resists for the production of integrated circuits

Photoresist AR-P 5300 series

Sensitive resists for the production of vapour deposition patterns by lift-off

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