53rd Issue of the AR NEWS
Content: 1. Allresist at the EIPBN (USA), MNE (Switzerland) and SEMICON Europa conferences // 2. The established HSQ resist Medusa 84 SiH // 3. Phoenix 81 also available as a PPA liquid resist for the NanoFrazor // 4. Environmentally friendly alternatives to TMAH- and NEP-based process chemicals // 5. Allresist expands and starts construction of building extension in May



