July 2024: Medusa 84 AR-N 8400 SiH, the improved HSQ alternative, in market launch

Through a targeted synthesis which precisely separates the stable and sensitive molecular fraction of the HSQ polymer, and through complex cleaning procedures, it is possible to offer a significantly more stable resist.

49th Issue of the AR NEWS

1. Allresist at the “8th Thermal Probe Workshop“ of Heidelberg Instruments Nano AG
2. From PPA powder to liquid resist: Phoenix 81
3. Medusa 84 SiH – SX AR-N 8400: Market launch has begun
4. Our current environmental activities: another tree-planting event!

January 2024: Electra 92 established on the market – AR-PC 5092.02

At AMOLF, Electra 92 was applied to HSQ deposited on a 40 nm thick SiO2 layer of a silicon wafer. Due to its highly hydrophobic surface, HSQ is particularly challenging. A specially adapted version of Electra 92 was required for this task.

Strategy workshop: we will not be available for you on January 30, 2024!

We will not be available for you on Tuesday, January 30, 2024 because of our strategy workshop but we will immediately take care of all inquiries and orders from January 31, 2024 again.

Donation for completed customer surveys

Thank you very much for your participation in our customer survey. Your support is essential to us to improve our products and services! Therefore, we transferred 200 € to the Save the Children charity organisation.

Important information about deliveries between years

In order to align operational procedures with the needs of our customers, we have set a final order acceptance date: Order stop: 12/11/2023 and Delivery stop: 12/13/2023

48th Issue of the AR NEWS

1. Allresist on the MNE 2023 in Berlin
2. Medusa 84 SiH – SX AR-N 8400, another alternative to HSQ with better properties
3. Rubin project – waveguide materials for the NIR/VIS range
4. Successful introduction of the new Electra 92
5. Coloured and fluorescent resists for optical applications

October 2023: Medusa 84 SiH – SX AR-N 8400 another alternative to HSQ

In contrast to Medusa 82, the optical transparency of Medusa 84 SiH is significantly higher, since it is made of purely inorganic components. This transparency is important for a large group of customers who use such resists for optical applications.

April 2023: E-beam PMMA resist AR-P 672.045 – the workhorse for electron beam lithography

Due to the high sales volume, AR-P 672.045 is our internal “market leader”. This resist is used by three major microchip manufacturers in France, Germany, and China. The consumption is thus steadily increasing, and meanwhile more than 300 liters of this resist are ordered annually.

47th Issue of the AR NEWS

1. On February 20, Allresist received an important IHK certificate for exemplary CO2 balance
in determining their carbon footprint on the path to climate neutrality
2. Allresist awarded as “Employer of the Future” on March 15
3. EOS 72: Our new, highly sensitive and alkali-resistant e-beam resist
4. New ZIM project – Photoresists for concave and convex surfaces
5. Allresist represented again at the EIPBN and MNE congresses