Content:
1. Working in the times of Corona
2. More efficient manufacture of Electra 92
3. RUBIN – highly promising project in optical sensor technology
4. EOS 72, a chemically amplified positive e-beam resist
5. Contribution against climate changes: Allresist plants trees
Content:
1. Allresist with view to the future
2. Investing in novel technologies
3. Structurable conductive layers
4. CSAR 62 – great demand around the world
Content:
1. Prime Minister Dietmar Woidke visits Allresist in times of Covid-19
2. Higher shelf live and more sensitive HSQ-alternative Medusa 82 for grayscale
lithography
3. Medusa for UV lithography
4. Thermally structurable resists
Content:
1. 27 years of Allresist – firmly established on the world market
2. Allresist successful on the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 for e-beam graytone lithography
4. Resist structures for the spin Hall effect
Content:
1. 27 years of Allresist – firmly established on the world market
2. Allresist successful on the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 for e-beam graytone lithography
4. Resist structures for the spin Hall effect
Content:
1. Synthesis week in the new production tract
2. Allresist at the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 passed comprehensive application tests
3.1. Dissolution test with the sensitive PAG-Medusa 82 (SX AR-N 8250)
3.2. Influence of a PEB on the sensitivity of Medusa 82
3.3. Plasma etching tests with Medusa structures
3.4. Medusa 82 with specifically low contrast
4. Five coloured negative resists on one glass wafer
Content:
1. 26 years of Allresist – Inauguration of the new plant on the company anniversary
2. Allresist’s great success with Medusa 82 at the MNE 2018
3. Further Allresist highlights at the MNE
4. Atlas 46 and CAR 44 for e-beam lithography
5. Phoenix 81 – World-wide sales begin!
6. Offspring at Allresist – The next generation!
Content:
1. Our building extension is progressing
2. Allresist at the congresses Triple Beam (EIPBN 2018) and MNE 2018
3. Atlas 46 variants for a selective two-layer build-up
4. Fluorescent resists for optics and sensors with Atlas 46 S
5. Medusa 82 – a resist turning into “stone” structures
6. New protective coating for KOH/HF etchings – BlackProtect SX AR-PC 5000/41
Content:
1. 25 years of Allresist – a success story also of resist development
2. Allresist at the MNE Conference with Atlas 46
3. New innovative product developments
3.1. Fluorescent and coloured resists for optics and sensor technologies
3.2. Thick(er) CSAR 62 for the production of deep etch pits
3.3. CSAR 62 in three-layer systems for the generation of T-gates
Content:
1. Allresist is planning a new building extension again in the 25th year of its existence
2. New innovative product developments
3. Scientific partnerships for the MNE 2017