Content:
1. Allresist on the MNE 2023 in Berlin
2. Medusa 84 SiH – SX AR-N 8400, another alternative to HSQ with better properties
3. Rubin project – waveguide materials for the NIR/VIS range
4. Successful introduction of the new Electra 92
5. Coloured and fluorescent resists for optical applications
Content:
1. On February 20, Allresist received an important IHK certificate for exemplary CO2 balance
in determining their carbon footprint on the path to climate neutrality
2. Allresist awarded as “Employer of the Future” on March 15
3. EOS 72: Our new, highly sensitive and alkali-resistant e-beam resist
4. New ZIM project – Photoresists for concave and convex surfaces
5. Allresist represented again at the EIPBN and MNE congresses
Content:
1. 30 years of Allresist: Appreciation by Prime Minister Woidke
2. Allresist on the EIPBN in New Orleans
3. Further improved Electra 92 – new AR-PC 5092
4. Allresist on the MNE in Leuven
5. Rubin-project – waveguide materials for the NIR/VIS-range
6. Allresist determines its CO2 footprint
Content:
1. Ukraine at war: We also bear responsibility
2. COVID-19: An endless story?
3. Allresist again present at congresses
4. Eco-friendly “green” PMMA developer
5. Profit project of the State of Brandenburg QD-LED
6. Allresist has planted trees
Content:
1. Working in the times of Corona
2. More efficient manufacture of Electra 92
3. RUBIN – highly promising project in optical sensor technology
4. EOS 72, a chemically amplified positive e-beam resist
5. Contribution against climate changes: Allresist plants trees
Content:
1. Allresist with view to the future
2. Investing in novel technologies
3. Structurable conductive layers
4. CSAR 62 – great demand around the world
Content:
1. Prime Minister Dietmar Woidke visits Allresist in times of Covid-19
2. Higher shelf live and more sensitive HSQ-alternative Medusa 82 for grayscale
lithography
3. Medusa for UV lithography
4. Thermally structurable resists
Content:
1. 27 years of Allresist – firmly established on the world market
2. Allresist successful on the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 for e-beam graytone lithography
4. Resist structures for the spin Hall effect
Content:
1. 27 years of Allresist – firmly established on the world market
2. Allresist successful on the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 for e-beam graytone lithography
4. Resist structures for the spin Hall effect
Content:
1. Synthesis week in the new production tract
2. Allresist at the congresses Triple Beam (EIPBN 2019) and MNE 2019
3. Medusa 82 passed comprehensive application tests
3.1. Dissolution test with the sensitive PAG-Medusa 82 (SX AR-N 8250)
3.2. Influence of a PEB on the sensitivity of Medusa 82
3.3. Plasma etching tests with Medusa structures
3.4. Medusa 82 with specifically low contrast
4. Five coloured negative resists on one glass wafer