Types of developers
There are two main groups of developers: solvent-based and aqueous-alkaline developers. The solvent-based ones are intended mainly for PMMA e-beam resists, for CSAR 62 and also for special polymer based products. In this process, solvents such as methylisobutylketone (MIBK), IPA (partly with water) for PMMA, amyl acetate, MIBK, DEK, DEM, xylol for CSAR 62 and ethylbenzene as well as hexane are used for the protective coating.