CSAR 62 single layer lift-off system
With our new development e-beam resist AR-P 6200 (CSAR 62), very fine structures like e.g. 10 nm wide trenches can be manufactured with very high contrast (> 14) and comparably high sensitivity.
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With our new development e-beam resist AR-P 6200 (CSAR 62), very fine structures like e.g. 10 nm wide trenches can be manufactured with very high contrast (> 14) and comparably high sensitivity.
Photoresists can also be used to incorporate fluorescent dyes. Particularly negative-tone photoresists are of interest in this regard, since the use of selected fluorescent dyes allows defining an adjustable emission in variable wavelength ranges. Resist layers with violet, blue, yellow, orange, or red fluorescence were produced by embedding the respective dyes into the negative-working Atlas 46 S resist.
Content:
1. Our building extension is progressing
2. Allresist at the congresses Triple Beam (EIPBN 2018) and MNE 2018
3. Atlas 46 variants for a selective two-layer build-up
4. Fluorescent resists for optics and sensors with Atlas 46 S
5. Medusa 82 – a resist turning into “stone” structures
6. New protective coating for KOH/HF etchings – BlackProtect SX AR-PC 5000/41
These poly(phthalaldehydes) are also suitable for electron beam lithography and for the fabrication of 200 nm thick fibers (electrospinning). The material produced from these threads evaporates immediately upon heating, which offers interesting application possibilities.
The new, highly insulating protective coating SX AR-PC 5060 F-Protect represents a good alternative to the well-known resist Cytop®.
The new development Atlas 46 could also be successfully used for nanoimprinting (University of Wuppertal, working group of Prof. Scheer). In a first step, nanostructures were produced with the negative-working resist
The outstanding properties of SU-8 are well known to all users of microsystem technologies. Allresists new negative resist Atlas 46 S (solid) can easily be processed with high reproducibility of all properties and with high restistance of resist structures to all commonly used solvents. Atlas 46 S is thus perfectly suitable for all applications in which the layer is intended to remain permanently and resistively on the substrate.
Das 25-jährige Bestehen feierte das Team der Allresist GmbH im Rahmen einer großen Feierlichkeit. Zu diesem Anlass haben die regionalen Zeitungen ausführliche Berichte über das erfolgreiche Unternehmen veröffentlicht.
Content:
1. 25 years of Allresist – a success story also of resist development
2. Allresist at the MNE Conference with Atlas 46
3. New innovative product developments
3.1. Fluorescent and coloured resists for optics and sensor technologies
3.2. Thick(er) CSAR 62 for the production of deep etch pits
3.3. CSAR 62 in three-layer systems for the generation of T-gates
In the quarter century of its existence, the Allresist Company established a solid place on the world market and an excellent reputation among its customers. We thus appropriately celebrated our company anniversary on 16 October 2017 with a festive event!
Since 1992, we provide our customers with high quality products at moderate prices. Due to an efficient research department and our “close ear“ to the customer, we quickly respond to the needs of the market and consistently offer product innovations.
Allresist GmbH
Am Biotop 14
15344 Strausberg
Germany
Tel: +49 3341 – 35 93 0
Fax: +49 3341 – 35 93 29
E-Mail: info(a)allresist.de
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