The new development Atlas 46 could also be successfully used for nanoimprinting (University of Wuppertal, working group of Prof. Scheer). In a first step, nanostructures were produced with the negative-working resist Atlas 46S and cured with UV light at a wavelength of 172 nm. The subsequent imprint step then yielded the desired hierarchical architecture.
- Realization of defined nanostructures by thermal imprinting
- Stabilization of the pre-structured surface by deep UV exposure
- Second imprint step to generate the hierarchical architecture
For this special application, different resists were evaluated:
Fig .: Evaluation of different negative photoresists for double imprint lithography
SU 8 and Atlas-resists show similarly good results since defined and very uniform structures could be generated, while CAR44 does not have the thermal stability required for this process. The big advantage of Atlas-resists however is the easy removability of the R-variant.
Overview Other Resists