The use of a combination of CSAR 62 and the conductive coating Electra 92 in e-beam lithography allows the manufacture of highly complex structures on insulating glass or semi-insulating substrates such as e.g. gallium arsenide. The very high sensitivity and the highest achievable resolution of CSAR 62 are harmoniously complemented by the good conductive properties of Electra 92.

30-150nm-Quadrate-CSAR 62-auf-Glas

30 – 150 nm squares of CSAR 62 on glass