AR-PC 5000 Archive - Allresist EN https://www.allresist.com/portfolio_entries/ar-pc-5000/ ALLRESIST GmbH - Strausberg, Germany Fri, 05 Jan 2024 08:09:17 +0000 en-GB hourly 1 https://wordpress.org/?v=6.5.2 Thinner AR 300-12 https://www.allresist.com/portfolio-item/thinner-ar-300-12/ Thu, 27 Jul 2017 16:30:37 +0000 https://www.allresist.de?post_type=portfolio&p=6657 For adjusting the film thickness of photoresists and e-beam resists

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Thinner AR 300-12

For adjusting the film thickness of photoresists and e-beam resists


Characterisation


  • ultra-filtered, colourless, high-purity organic solvent mixtures
  • adjustment of resist film thickness by defined dilution
  • edge bead removal of coated substrates as well as cleaning of equipment
  • removal of photoresist films tempered at up to 150 °C and of non-tempered e-beam resist films

Interesting Resist Wiki articles



Properties


  • Main component
    PGMEA
  • Flash point (°C)
    42°C
  • Water content max. (%)
    0,1%
  • Non-volatiles max. (%)
    0,002%

Available order sizes


  • 1 x 2.5 L
  • 4 x 2.5 L
  • 8 x 2.5 L

Please contact us for further requests.

Suitable products


E-Beam Resist AR-N 7500 series

High resolution, process-stable (no CAR) resist for mix & match-processes, temperature stable up to 120 °C

E-Beam Resist AR-N 7520 new series

Highest resolution and highly sensitive resist for mix & match, thermostable up to 140 °C

E-Beam Resist AR-N 7520 series

High resolution resist for mix & match-processes, for high-precision edges, thermo-stable up to 140 °C

E-Beam Resist AR-N 7700 series

High-resolution e-beam resists for the production of integrated circuits

E-Beam Resist AR-N 7720 series

AR-N 7720 e-beam resists with flat gradation High-resolution e-beam resists for the production of diffractive optics

E-Beam Resist AR-P 6510 series

Thick positive resists for the production of microcomponents

Photoresist AR-N 4340 (CAR)

Highly sensitive negative resist for the production of integrated circuits

Photoresist AR-N 4400 series

Thick and very thick negative resists for electroplating, microsystem technology and LIGA

Photoresist AR-N 4450-10 T (CAR 44)

Thick negative resists for electroplating, microsystems technology and LIGA ≤ 20 μm

Photoresist AR-N 4600 series (Atlas 46)

Thick negative resists for electroplating, microsystems technologies and LIGA < 20 μm

Photoresist AR-P 3100 series

Adhesion-enhanced positive resists for the production of masks and fine scale divisions

Photoresist AR-P 3200 series

Thick positive resists for electroplating and microsystems technology

Photoresist AR-P 3500 (T) series

Sensitive positive-tone standard resists for the production of integrated circuits

Photoresist AR-P 3740

Sensitive positive-tone standard resists for the production of highly integrated circuits

Photoresist AR-P 5300 series

Sensitive resists for the production of vapour deposition patterns by lift-off

Photoresist SX AR-N 4340/7

Negative photoresist for one- and two-layer systems, thermostable up to 300 °C

Photoresist SX AR-P 3500/8

Positive photoresist for high-temperature application up to 300 °C

Protective Coating AR-PC 504

Wafer backside protection during front side etchings for the production of deep structures in silicon

Protective Coating AR-PC 5040

Wafer backside protection during front side etchings for the production of deep structures in silicon


Request for AR 300-12

The post Thinner AR 300-12 appeared first on Allresist EN.

]]> Remover AR 600-71 https://www.allresist.com/portfolio-item/remover-ar-600-71/ Thu, 27 Jul 2017 16:15:10 +0000 https://www.allresist.de?post_type=portfolio&p=7428 For the stripping of tempered photoresist and e-beam resist films

The post Remover AR 600-71 appeared first on Allresist EN.

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Remover AR 600-71

For the stripping of tempered photoresist and e-beam resist films


Characterisation


  • organic solvent

Interesting Resist Wiki articles



Properties AR 600-71


  • Main component
    dioxolane
  • Flash point (°C)
    -17 °C

Available order sizes


  • 1 x 2.5 L
  • 4 x 2.5 L
  • 8 x 2.5 L

Please contact us for further requests.

Suitable products


E-Beam Resist AR-N 7500 series

High resolution, process-stable (no CAR) resist for mix & match-processes, temperature stable up to 120 °C

E-Beam Resist AR-N 7520 new series

Highest resolution and highly sensitive resist for mix & match, thermostable up to 140 °C

E-Beam Resist AR-P 617 series

Resists for nanometer lithography, highest resolution, Copolymer 33% MA, Solvent: methoxypropanol

E-Beam Resist AR-P 6200 series (CSAR 62)

High-contrast e-beam resists for the production of integrated circuits and masks

E-Beam Resist AR-P 632 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 639 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 641 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 642 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 649 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 6510 series

Thick positive resists for the production of microcomponents

E-Beam Resist AR-P 661 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 662 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 669 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 671 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 672 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 679 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

Photoresist AR-N 2200 series

Ready-to-use negative spray resists for various applications

Photoresist AR-N 4400 series

Thick and very thick negative resists for electroplating, microsystem technology and LIGA

Photoresist AR-P 1200 series

Ready-to-use positive spray resists for various applications

Photoresist AR-P 3200 series

Thick positive resists for electroplating and microsystems technology

Photoresist AR-P 3500 (T) series

Sensitive positive-tone standard resists for the production of integrated circuits

Photoresist AR-P 3740

Sensitive positive-tone standard resists for the production of highly integrated circuits

Photoresist AR-P 5300 series

Sensitive resists for the production of vapour deposition patterns by lift-off

Protective Coating AR-PC 504

Wafer backside protection during front side etchings for the production of deep structures in silicon

Protective Coating AR-PC 5040

Wafer backside protection during front side etchings for the production of deep structures in silicon


Request for AR 600-70, 600-71, 300-70, 300-72, 300-73, 300-76

The post Remover AR 600-71 appeared first on Allresist EN.

]]> Remover AR 300-76 https://www.allresist.com/portfolio-item/remover-ar-300-76/ Thu, 27 Jul 2017 16:05:04 +0000 https://www.allresist.de?post_type=portfolio&p=7430 For the stripping of tempered photoresist and e-beam resist films

The post Remover AR 300-76 appeared first on Allresist EN.

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Remover AR 300-76

For the stripping of tempered photoresist and e-beam resist films


Characterisation


  • organic solvents

Interesting Resist Wiki articles



Properties


  • Hauptbestandteil
    Aceton
  • Flammpunkt
    -17 °C

Available order sizes


  • 1 x 2.5 L
  • 4 x 2.5 L
  • 8 x 2.5 L

Please contact us for further requests.

Suitable products


Bottom Resist AR-BR 5460

Positive or negative system for optically transparent and thermally resistant structures

Bottom Resist AR-BR 5480

Positive or negative system for optically transparent and thermally resistant structures

E-Beam Resist AR-N 7500 series

High resolution, process-stable (no CAR) resist for mix & match-processes, temperature stable up to 120 °C

E-Beam Resist AR-N 7520 new series

Highest resolution and highly sensitive resist for mix & match, thermostable up to 140 °C

E-Beam Resist AR-N 7520 series

High resolution resist for mix & match-processes, for high-precision edges, thermo-stable up to 140 °C

E-Beam Resist AR-N 7700 series

High-resolution e-beam resists for the production of integrated circuits

E-Beam Resist AR-N 7720 series

AR-N 7720 e-beam resists with flat gradation High-resolution e-beam resists for the production of diffractive optics

E-Beam Resist AR-P 617 series

Resists for nanometer lithography, highest resolution, Copolymer 33% MA, Solvent: methoxypropanol

E-Beam Resist AR-P 6200 series (CSAR 62)

High-contrast e-beam resists for the production of integrated circuits and masks

E-Beam Resist AR-P 632 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 639 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 641 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 642 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 649 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 6510 series

Thick positive resists for the production of microcomponents

E-Beam Resist AR-P 661 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 662 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 669 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 671 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 672 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

E-Beam Resist AR-P 679 series

PMMA resist series 50K – 950K for the production of integrated circuits and masks

Photoresist AR-N 2200 series

Ready-to-use negative spray resists for various applications

Photoresist AR-N 4340 (CAR)

Highly sensitive negative resist for the production of integrated circuits

Photoresist AR-P 1200 series

Ready-to-use positive spray resists for various applications

Photoresist AR-P 3100 series

Adhesion-enhanced positive resists for the production of masks and fine scale divisions

Photoresist AR-P 3200 series

Thick positive resists for electroplating and microsystems technology

Photoresist AR-P 3500 (T) series

Sensitive positive-tone standard resists for the production of integrated circuits

Photoresist AR-P 3740

Sensitive positive-tone standard resists for the production of highly integrated circuits

Photoresist AR-P 5300 series

Sensitive resists for the production of vapour deposition patterns by lift-off

Photoresist SX AR-N 4340/7

Negative photoresist for one- and two-layer systems, thermostable up to 300 °C

Photoresist SX AR-P 3500/8

Positive photoresist for high-temperature application up to 300 °C

Protective Coating AR-PC 504

Wafer backside protection during front side etchings for the production of deep structures in silicon

Protective Coating AR-PC 5040

Wafer backside protection during front side etchings for the production of deep structures in silicon


Request for AR 300-76

The post Remover AR 300-76 appeared first on Allresist EN.

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